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Project: Visualization of Large Wafer Datasets

Description

Within Metrology & Patterning Control we focus on delivering cost efficient metrology and control solutions that help customers optimize scanner performance to maximize yield. With ever shrinking overlay margins this requires increasingly detailed overlay measurements: more measurements per wafer and more wafers measured, resulting in a vast amount of wafer data. The size of this data is becoming a challenge for the visualization (dashboard) tooling, which we use to gain insight into the contributions of the physical effects within the machine that lead to deviations in (overlay) performance.

 

The aim of the project is to find novel visualization techniques that apply to this type of data and scale with its ever increasing size (density of the measurements + number of measured wafers). The solution needs to enable the user to spot patterns, trends, outliers, and to easily compare subsets of the data. This implies a strong focus on (1) user interaction and (2) performance. User interactions must adhere to usability principles as effectiveness, efficiency, and user satisfaction. To guarantee performance (maximum tolerable UI response time), all algorithms and data structures used must be well justified.

 

In this assignment you will:

- Gather the needs of the experts that work with the data

- Design visualizations, interaction patterns, and algorithms

- Build a prototype that fits in the existing tooling

- Validate your solution by means of a user study

Details

Student

AE

Angelos Erotokritou

Supervisor

Stef van den Elzen

Secondary supervisor

PC

Paul van der Corput (ASML)

External location

ASML